Diamond Characterisation Equipment
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A Renishaw 2000 laser Raman spectrometer. This 3-wavelength system (UV at 325 nm, green at 514 nm and IR at 785 nm) allows the sp2/sp3 content of the films to be evaluated, as well as the quality and uniformity of the deposited films via a line-scan and 2D mapping facility. |
Optical emission spectroscopy equipment, both high and low resolution, for plasma diagnostics.. We also have a cavity ring-down spectroscopy system for measurements of absolute concentratins of the plasma as a function of position. |
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| An Ellipsometer - for measurements of film thickness and optical properties. This is more useful for obtaining the optical properties (refractive index and thickness) of DLC films rather than for crystalline diamond. | Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) analysis are available as part of the Electron Microscopy Facility (within the School of Chemistry. |
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A Bruker Tunelling Atomic-Force Microscope (TUNA) system - for studies of surface morphology and conductivity is also available in the Electron Microscopy Facility. This allows near atomic-scale resoluion of surface features, as well as 3D surface maps overlaid with surface conductivity and electron emission profiles. |
X-Ray Diffraction facilities - for determining crystal structures of solids and powders are available in the department. These can analyse thin films or powders, including nanodiamond. |
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| A Hall-effect system - featuring a 1 T magnet for measuring n,p-type conductivity. The sample can be turned over to flip the direction of the magneic field to ensure accuracy of the readings. | A Zeiss high-magnification (1200x) optical microscope with Normanksi interference filters. This high quality microscope allows superb images of micron-sized diamond crystallites, and has a camera attachment for hard-copies. |
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| A high-vacuum field-emission testing station. This uses a high voltage probe to extract electrons from the surface of a grounded diamond substrate, and can measure the voltage required to do this as a function of electrode-substrate separation. | A high-vacuum testing station for measuring the secondary electron yield from a diamond surface. Various configurations can be sued to measure the yeield in reflection or transmission modes, and as a function of primary electron energy supplied by a variable power electron gun. |
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| A high-pressure (10 atm) testing station - for studying the operation of diamond microplasma devices. Various gases can be used, such as Ar and He, and the plasma can be studied via a viewport at the top. | NanoESCA system - capable of a multitude of UHV in situ experiments, including XPS, LEED, PEEM and monolayer evaporation. We also have an Omicron high-resolution STM and Kelvin probe system - for measuring surface work functions. |