Diamond Characterisation Equipment

A Renishaw 2000 laser Raman spectrometer. This 3-wavelength system (UV at 325 nm, green at 514 nm and IR at 785 nm) allows the sp2/sp3 content of the films to be evaluated, as well as the quality and uniformity of the deposited films via a line-scan and 2D mapping facility.

Raman system

Optical emission spectroscopy equipment, both high and low resolution, for plasma diagnostics.. We also have a cavity ring-down spectroscopy system for measrements of absolute concentratins of the plasma as a function of position.

OES kit
An Ellipsometer for measurements of film thickness and optical properties. This is more useful for obtaining the optical properties (refractive index and thickness) of DLC films rather than for crystalline diamond. Ellipsometer

Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) analysis are available as part of the Electron Microscopy Facility (within the School of Chemistry.

SEM

A Bruker Tunelling Atomic-Force Microscope (TUNA) system (left) for studies of surface morphology and conductivity is also available in the Electron Microscopy Facility. This allows near atomic-scale resoluion of surface features, as well as 3D surface maps overlaid with surface conductivity and electron emission profiles.

X-Ray Diffraction facilities (right) for determining crystal structures of solids and powders are available in the department. These can analyse thin films or powders, including nanodiamond.

TUNAXRD
A Hall-effect system featuring a 1 T magnet for measuring n,p-type conductivity. The sample can be turned over to flip the direction of the magneic field to ensure accuracy of the readings. Hall kit
A Zeiss high-magnification (1200x) optical microscope with Normanksi interference filters. This high quality microscope allows superb images of micron-sized diamond crystallites, and has a camera attachment for hard-copies. microscope
A high-vacuum field-emission testing station. This uses a high voltage probe to extract electrons from the surface of a grounded diamond substrate, and can measure the voltage required to do this as a function of electrode-substrate separation. field-emission-kit
A high-vacuum testing station for measuring the secondary electron yield from a diamond surface. Various configurations can be sued to measure the yeield in reflection or transmission modes, and as a function of primary electron energy supplied by a variable power electron gun. SEE kit
A high-pressure (10 atm) testing station for studying the operation of diamond microplasma devices. Various gases can be used, such as Ar and He, and the plasma can be studied via a viewport at the top. High-pressure kit
NanoESCA system capable of a multitude of UHV in situ experiments, including XPS, LEED, PEEM and monolayer evaporation. We also have an Omicron high-resolution STM and Kelvin probe system for measuring surface work functions. NanoESCA

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