CVD Diamond Deposition Reactors

A small hot filament CVD diamond reactor for studies of unusual gas chemistries and n-type doping. This is limited to substrate areas of about 1 sq. cm, and has a diamond growth rate around 0.5 μm h-1. But it is a very cheap, flexible and reliable reactor suitable for proof-of-principle experiments and trying out novel ideas.

Undoped HFCVD reactor

Another small hot filament CVD diamond reactor dedicated for depositing B-doped diamond films using diborane as the B supply. This reactor is also limited to substrate areas of about 1 sq. cm, and also has a diamond growth rate around 0.5 μm h-1. The B content of the films can be controlled between 1018 and 1021 cm-3, which is from lightly semiconducting to near metallic conductivity.

B-doped HFCVD reactor
A larger hot filament reactor dedicated to deposition onto wires and fibres. The machine was originally designed by the company Thomas Swan, and holds two filaments each of which is surrounded by 30-40 tungsten wires (10 cm long) whch can be simultaneously coated in diamond. The growth rate is still only 0.5 μm h-1, but it is fully interlocked so it can be left running continuously for many dyas allowing diamond film thicknesses of 100 μm to be deposited. Thomas Swan HFCVD reactor

A 1.5 kW Microwave PECVD reactor with in situ mass spectroscopy diagnostics. The substrate area is about 2sq.cm and this reactor can grow diamond at up to 20 μm h-1.

MW CVD reactor

A 2 kW microwave plasma system for plasma diagnostic studies. This has been donated to us by Element Six) and set up to allow interrogation of the plasma and dark-space via various forms of emission and laser spectroscopy.

MW CVD reactor

A DC plasma deposition system for growing large-area (6") polycrystalline diamond wafers.

Ripples in the DC plasma

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