Publications

Abstract

'Thin Film Diamond by Chemical Vapour Deposition Methods'

M.N.R. Ashfold, P.W. May, C.A. Rego, N.M. Everitt

Chem. Soc. Rev., 23 (1994) 21-30.

This paper is a review of the current state of the art in CVD diamond technology, written for non-experts or beginners to have an introduction to the subject. It includes a description of typical CVD reactors, and a brief discussion of the mechanisms suggested for diamond growth. Properties of deposited films are discussed, as well as the various techniques used to analyse the quality (diamond:non-diamond ratio) of the films. Problems with growth onto substrates of different materials are detailed in terms of the reactivity and solubility of the material towards carbon, and thermal expansion mismatch. The paper concludes with a section of present and future applications of diamond films, both on planar substrates and diamond-coated wires and fibres.

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